纳米氮化硅在提高PS版耐磨性中的应用研究

测试了纳米氮化硅可以使阳图PS版耐磨性提高30%,对感光度和分辨率没有影响.将<20nm氮化硅(0.0%—2.0%质量分数)超声波分散在混合溶剂中,再依次投入成膜树脂和光敏剂配制成感光胶,经离心涂布在(砂目Ra=0.65)铝版基上干燥后,晒版,显影,磨版.由反射密度的损失量评定印版耐磨性,由扫描电镜观察氮化硅纳米粒子在版面的状态.氮化硅质量分数为0.15%时耐印效果最好,大于2.0%时由SEM观察到团聚现象,印刷力下降.

Study of Nanoparticle Using in PS Plate for Antiscratching

This paper reported nanoparticle using in PS plate for antiscratching.Offset plate bearing capacity enhanced for thirty percent when 0.15% mass fraction Si3N4 was added.The addition of nanoparticle did not affect printing resolving power and photosensitivity when <20 nm silicon nitrification nanoparticle(0.0%—2.0% mass fraction) were dispersed in photosensitive fluid coating.In this process the mixture was homogenized by blender together and an ultrasonicator(Ultrasonic Homogenizer UH-600,SMT Co.) operated at 80% intensity for 10 minutes.Next step,the other ingredient were dissolved.Then the coating was coated by spin coating machine on electrolyte-oxidation aluminium substrate.dried,exposed,developed,antiscratching test.Antiscratching ability was evaluated by the loss of reflection density.The nanoparticle state was observed by SEM.From SEM it could observed that the plate had an optimal antiscratching ability when 0.15% mass fraction Si3N4 was added,however,when Si3N4 mass fraction was more than 2.0%,Si3N4 configuration was observed and the plate antiscratching ability became poor.