| h-线敏感光致产碱剂PNCDP的合成与表征 |
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| 引用本文： | 刘金刚,Mitsuru Ueda.h-线敏感光致产碱剂PNCDP的合成与表征[J].影像科学与光化学,2009,27(2):95-102. |
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| 作者姓名： | 刘金刚 Mitsuru Ueda |
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| 作者单位： | 1. 中国科学院,化学研究所,高技术材料实验室,北京,100190
2. 东京工业大学,有机高分子物质专攻,东京,152-8552,日本 |
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| 摘 要： | 设计并合成了一种对高压汞灯发射光谱中的h-线(405 nm)敏感的新型光致产碱剂(PBG)——N-{(5-哌啶-2-硝基苄基)氧]-羰基}-2,6-二甲基哌啶(PNCDP).通过红外(IR)、核磁(NMR)以及元素分析对PNCDP的结构进行了表征.紫外-可见光谱(UV-Vis)测试结果表明,与传统的i-线(365 nm)敏感PBG——N-{(4,5-二甲氧基-2-硝基苄基)氧]-羰基}-2,6-二甲基哌啶(DNCDP)相比,PNCDP的最大紫外吸收波长为395.5 nm,较DNCDP红移了52.5 nm.初步光刻实验表明,PNCDP对h-线具有较好的敏感度.
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| 关 键 词： | 光致产碱剂 h-线 聚酰亚胺 光致抗蚀剂 |
Synthesis and Characterization of a New h-Line Sensitive o-Nitrobenzyl Carbamate Photobase Generator |
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| LIU Jingang,Mitsuru Ueda.Synthesis and Characterization of a New h-Line Sensitive o-Nitrobenzyl Carbamate Photobase Generator[J].Imaging Science and Photochemistry,2009,27(2):95-102. |
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| Authors: | LIU Jingang Mitsuru Ueda |
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| Abstract: | A new photobase generator(PBG),N-{(2-nitro-5-piperidinylbenzyl)oxy]-carbonyl}-2,6-dimethylpiperidine(PNCDP) was designed and synthesized.The chemical structure was identified by FT-IR,NMR,and elemental analysis.PNCDP exhibited the maximum absorbance wavelength of 395.5 nm by UV-Vis measurement,which was 52.5 nm longer than that of the conventional PBG N-{(2-nitro-4,5-dimethoxybenzylpiperidinyl)oxy]carbonyl}-2,6-dimethyl-piperidine(DNCDP).Preliminary photolithography test showed that the PNCDP showed good sensitivity upon irradiation at h-line(405 nm) of high-pressure mercury lamp. |
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| Keywords: | photobase generator h-line polyimide photoresist |
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