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Ruthenium(III)-carbonyl and ruthenium(II)-nitrosyl complexes of nitrogen-containing ligands with ethoxysilane groups
Authors:Li-Miao Shi  Xin-Xin Wang  Xiu-Fang Ma  Ai-Quan Jia
Institution:Institute of Molecular Engineering and Applied Chemistry, Anhui University of Technology, Ma’anshan, PR China
Abstract:Reactions of γ-aminopropyltriethoxysilane and 4-(diethylamino)salicylaldehyde in ethanol afforded a Schiff base L1H, which reacted with Ru(CO)2Cl2]n in the presence of Et3N in THF giving a ruthenium(III) carbonyl complex RuCl(CO)21-O-L1)(η2-O,N-L1) (1). Treatment of γ-aminopropyltriethoxysilane with 4-pyridinecarboxaldehyde gave the Schiff base L2. Interactions of L2, γ-aminopropyltriethoxysilane, and Ru(NO)Cl3?H2O in THF led to the formation of a ruthenium(II) nitrosyl complex RuCl3(NO)(L2)H2N(CH2)3Si(OEt)3] (2) with linear N≡O ligand. Complexes 1 and 2 were characterized by microanalyses and IR and MS spectroscopies and confirmed by single-crystal X-ray diffraction.
Keywords:Ruthenium  Schiff base  ethoxysilane groups  crystal structure
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