Highly permeable mesoporous silica membranes synthesized by vapor infiltration of tetraethoxysilane into non-ionic alkyl poly(oxyethylene) surfactant films

Mesoporous silica membranes were prepared on porous alumina substrates by a vapor infiltration of tetraethoxysilane (TEOS) into a non-ionic poly(oxyethylene) (Brij56) surfactant film. Periodic mesostructured silica membranes were formed on both α- and γ-alumina substrates pre-treated with polystyrene. The polystyrene polymer plugged the pores of the alumina substrates and inhibited the deposition of silica in the alumina pores, resulting in the formation of a very thin silica membrane without a silica/alumina composite layer at the interface between mesoporous silica and the alumina substrates. The calcined mesoporous silica membrane showed very high nitrogen permeance (>10⁻⁶ mol m⁻² s⁻¹ Pa⁻¹). The single gas permeation was governed by the Knudsen diffusion mechanism. The durability of the mesoporous silica membrane against moisture in air was improved by a silylation with trimethylethoxysiliane.