| 半导体硅上激光诱导化学沉积镍薄膜 |
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| 引用本文： | 刘冰,龚正烈.半导体硅上激光诱导化学沉积镍薄膜[J].应用化学,1999,16(1):80-82. |
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| 作者姓名： | 刘冰 龚正烈 |
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| 作者单位： | 南开大学新能源材料化学研究所，郑州煤炭管理干部学院，天津大学化工学院 |
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| 摘 要： | 由于激光具有高能量密度、高单色性以及良好的相干性，在表面处理技术中的应用越来越广泛．在金属、半导体和高聚物基体上，从水溶液进行激光诱导的化学沉积引起了人们的极大注意，这种工艺在微电子电路及器件上有广泛的应用前景．与传统的化学镀相比，它具有明显的优越性...
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| 关 键 词： | 激光诱导化学沉积，镍，半导体硅 |
Laser Induced Electroless Deposition of Nickel on Semiconductor Silicon |
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| Liu Bing ,Gong Zhenglie ,Yao Suwei ,Guo Hetong ,Yuan Huatang ,Zhang Yunshi.Laser Induced Electroless Deposition of Nickel on Semiconductor Silicon[J].Chinese Journal of Applied Chemistry,1999,16(1):80-82. |
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| Authors: | Liu Bing Gong Zhenglie Yao Suwei Guo Hetong Yuan Huatang Zhang Yunshi |
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| Institution: | Liu Bing *1,Gong Zhenglie 2,Yao Suwei 3,Guo Hetong 3,Yuan Huatang 1,Zhang Yunshi 1 |
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| Abstract: | Laser induced electroless deposition of nickel on the semiconductor silicon after Pd impregnation has been carried out by using YAG laser and investigated by XPS combined with Ar sputtering technique. The results indicated the existence of interdiffusion between Ni, Pd and Si at room temperature and formation of different silicide compounds. |
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| Keywords: | laser induced electroless deposition nickel semiconductor silicon |
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