| 聚L－缬氨酸修饰石墨电极不对称还原苯甲酰甲酸 |
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| 引用本文： | 陈刚,陆嘉星,徐承天,高剑南,陈良,张五昌.聚L－缬氨酸修饰石墨电极不对称还原苯甲酰甲酸[J].应用化学,1996,0(6):78-80. |
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| 作者姓名： | 陈刚 陆嘉星 徐承天 高剑南 陈良 张五昌 |
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| 作者单位： | 华东师范大学化学系 上海 200062 |
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| 摘 要： | 近年来,用化学修饰电极进行不对称合成日益受到人们重视.Nonaka等用聚L-撷氨酸(PLV)修饰石墨电极(Ce/PLV)和修饰铂电极(Pte/PLV)分别还原4-甲基香豆素和氧化苯基叔丁基醚,产物光学收率(o.y.)分别为43%和93%,而用Ce/PLV还原拨基化合物的研究尚不多见.
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| 关 键 词： | 聚L－缬氨酸 修饰电极 不对称还原 苯甲酰甲酸 |
| 收稿时间： | 1996-02-16 |
| 修稿时间： | 1996-08-12 |
Asymmetric Reduction of Phenylglyoxylic Acid Using Poly-L-Valine Modified Graphite Electrode |
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| Chen Gang,Lu Jiaxing,Xu Chengtian,Gao Jiannang,Chen Liang,Zhang Wuchang.Asymmetric Reduction of Phenylglyoxylic Acid Using Poly-L-Valine Modified Graphite Electrode[J].Chinese Journal of Applied Chemistry,1996,0(6):78-80. |
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| Authors: | Chen Gang Lu Jiaxing Xu Chengtian Gao Jiannang Chen Liang Zhang Wuchang |
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| Institution: | Department of Chemistry, East China Normal University, Shanghai 200062 |
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| Abstract: | Poly-L-valine was modified on graphite to produce polymer modified graphite electrode(Ce/PLV) on which phenylglyoxylic acid(PGA) was reduced to S( )-mandelic acid(SMA).By using Ce/PLV,the optical yield(o.y.) of SMA and conversion percent of PGA were measured as functions of various factors.The highest o.y.obtained under optimized conditions was 63.8%.A possible stereochemical model of asymmetric reduction of PGA was proposed. |
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| Keywords: | poly-L-valine modified electrode asymmetric reduction phenylglyoxylic acid |
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