| 电沉积硅烷分子印迹膜修饰电极的制备及其应用 |
| |
| 引用本文： | 王桂林,王荣,吴霞琴,章宗穰.电沉积硅烷分子印迹膜修饰电极的制备及其应用[J].电化学,2008,14(2):130. |
| |
| 作者姓名： | 王桂林 王荣 吴霞琴 章宗穰 |
| |
| 作者单位： | 上海师范大学生命与环境科学学院化学系,上海师范大学生命与环境科学学院化学系,上海师范大学生命与环境科学学院化学系,上海师范大学生命与环境科学学院化学系 上海200234,上海200234,上海200234,上海200234 |
| |
| 基金项目： | 国家自然科学基金
,
上海市科委资助项目 |
| |
| 摘 要： | 以3,4-二羟基苯甲酸作模板分子,在玻碳电极表面恒电位沉积四甲氧基硅烷和苯基三甲氧基硅烷,经无水乙醇将模板分子洗脱,制得硅溶胶-凝胶分子印迹膜电极.该电极能有效地抑制电化学氧化过程中3,4-二羟基苯甲酸的电聚合及其同分异构体2,4-二羟基苯甲酸对测定的干扰.实验表明,该修饰电极对3,4-二羟基苯甲酸测定的线性浓度范围为1.0×10-5~8.0×10-4mol.L-1,浓度检测下限为5.0×10-6mol.L-1.
|
| 关 键 词： | 3 4-二羟基苯甲酸 2 4-二羟基苯甲酸 分子印迹技术 硅溶胶-凝胶分子印迹膜 修饰电极 |
| 收稿时间： | 2008-05-28 |
Electrodeposition of Sol-gel Imprinted Films Modified Electrode and its Application for 3,4-Dihydroxybenzoic Acids Determination |
| |
| WANG Gui-lin,WANG Rong,WU Xia-qin,ZHANG Zong-rang.Electrodeposition of Sol-gel Imprinted Films Modified Electrode and its Application for 3,4-Dihydroxybenzoic Acids Determination[J].Electrochemistry,2008,14(2):130. |
| |
| Authors: | WANG Gui-lin WANG Rong WU Xia-qin ZHANG Zong-rang |
| |
| Institution: | WANG Gui-lin,WANG Rong,WU Xia-qin,ZHANG Zong-rang(Department of Chemistry,Shanghai Normal University,Shanghai 200234,China) |
| |
| Abstract: | The sol-gel molecularly imprinted films modified glassy carbon electrode was prepared by electrodeposition of tetramethoxysilane(TMOS) and phenyltrimethoxysilane(PTMOS) with chronoamperometry in the presence of template molecules 3,4-dihydroxybenzoic acid(3,4-DHBA) followed by extraction with ethanol.The modified electrode could successfully avoid the polymerization of oxidized 3,4-DHBA and the interference of 2,4-DHBA.A linear concentration response curve was obtained from 1.0 × 10-5 mol·L-1 to 8.0×10-4 mol·L-1,with the detected concentration limit of 5.0 × 10-6 mol·L-1. |
| |
| Keywords: | 3 4-dihydroxybenzoic acid 2 molecular imprinted technique silica sol-gel molecular imprinted films modified electrode |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
| 点击此处可从《电化学》浏览原始摘要信息 |
| 点击此处可从《电化学》下载免费的PDF全文 |
|
