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晶态氮化碳薄膜的低温合成
引用本文:马志斌,汪建华,万 军,黄杨风.晶态氮化碳薄膜的低温合成[J].无机化学学报,2004,20(3):349-352.
作者姓名:马志斌  汪建华  万 军  黄杨风
作者单位:武汉化工学院材料科学与工程学院,湖北省等离子体化学与新材料重点实验室,武汉,430073
基金项目:武汉市青年晨光计划资助项目(No.20025001014)。
摘    要:The synthesis of carbon nitride films at low temperature has been investigated using pulsed arc discharge from methanol solution with nitrogen atmosphere. Raman spectra and X-ray diffraction (XRD) analysis suggest that crystalline carbon nitride films may be prepared at low substrate temperature (220 ℃). At same time, the substrate temperature has a significantly effect on the nitrogen content and structure of the films. Increasing substrate temperature (300 ℃) would decrease the content of nitrogen in the films and result in a formation of carbon films.

关 键 词:脉冲电弧放电  氮化碳  甲醇
修稿时间:2003年9月22日

Synthesis of Crystalline Carbon Nitride Films at Low Temperature
MA Zhi-Bin,WANG Jian-Hu,WAN Jun and HUANG Yang-Feng.Synthesis of Crystalline Carbon Nitride Films at Low Temperature[J].Chinese Journal of Inorganic Chemistry,2004,20(3):349-352.
Authors:MA Zhi-Bin  WANG Jian-Hu  WAN Jun and HUANG Yang-Feng
Institution:School of Material Science and Technology, Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province, Wuhan 430073,School of Material Science and Technology, Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province, Wuhan 430073,School of Material Science and Technology, Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province, Wuhan 430073 and School of Material Science and Technology, Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province, Wuhan 430073
Abstract:
Keywords:pulsed arc discharge  carbon nitride  methanol
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