高硅SSZ-13分子筛膜二次水热生长过程

采用稀释模板剂合成溶胶在管状莫来石支撑体上制备高硅SSZ-13分子筛膜以研究膜的二次水热生长过程。对433 K下二次生长2~72 h的膜和底料进行表征，XRD表明膜和底料中的SSZ-13特征峰均在6 h后出现。底料中的晶粒尺寸基本不随晶化时间的延长而变化。在298 K和0.4 MPa测试条件下，433 K晶化72 h的SSZ-13分子筛膜CO₂渗透通量为2.08×10^-7 mol·m^-2·s^-1·Pa^-1，CO₂/CH₄理想选择性为24。探讨了SSZ-13分子筛膜的生长过程：涂覆在支撑体上的晶种首先溶解并形成大量有序的结构单元，诱导溶胶中晶粒形成并快速生长，晶粒沉积在支撑体的表面共生形成无缺陷的膜层。

Hydrothermal Secondary Growth Process of High-Slica SSZ-13 Zeolite Membrane

High-silica SSZ-13 zeolite membranes were prepared on tubular mullite supports using a diluted organic template gel composition to investigate the hydrothermal growth process. Membranes and powders at the bottom of autoclave were characterized after secondary growth from 2 to 72 h at 433 K, and the XRD patterns show SSZ-13 characteristic peaks appeared in the membranes and powders simultaneously after 6 h. The size of zeolite crystals in the powder was almost the same when the synthesis time delayed. The SSZ-13 membrane synthesized at 433 K and 72 h had a CO₂ permeance of 2.08×10^-7 mol·m^-2·s^-1·Pa^-1 with an ideal selectivity of CO₂/CH₄ of 24 at 298 K and 0.4 MPa. The possible growth process of SSZ-13 zeolite membrane was proposed with the seeds coated on supports dissolved and formed numerous orderly structure units in the gel firstly, inducing SSZ-13 zeolite crystals generated and grew rapidly, the crystals deposited on the supports, grew up and intergrew for limited space to from a defectfree layer.