首页 | 本学科首页   官方微博 | 高级检索  
     检索      

高透光p型CuSCN薄膜的电沉积制备及机理研究
引用本文:武卫兵,靳正国,华缜,付亚楠,邱继军.高透光p型CuSCN薄膜的电沉积制备及机理研究[J].无机化学学报,2005,21(3):383-388.
作者姓名:武卫兵  靳正国  华缜  付亚楠  邱继军
作者单位:天津大学先进陶瓷与加工技术教育部重点实验室,材料学院,天津,300072
基金项目:天津市基础研究重点项目(No.F103004)
摘    要:A stable aqueous electrolyte solution containing Cu(Ⅱ) cations and (SCN) anions was prepared by adding EDTA(ethylenediamine tetraacetic acid disodium salt, C10H14N2O8Na2·2H2O) to chelate with Cu(Ⅱ) cations. CuSCN films were electrodeposited on transparent ITO conducting substrates from as-prepared electrolyte solution. Deposition mechanisms of CuSCN at varied temperatures have been studied. The results indicate that electron quantum tunnel through CuSCN film plays a role and the dense thin film with nanocrystals was obtained at or below room temperature. However, at higher temperature, a thermally activated process was involved and a thick film was obtained. It has been calculated that the activation energy of the growth for crystals is 0.5 eV. XPS pattern shows that the electrodeposited film is (SCN) in stoichiometric excess, indicating a p-type film. As-prepared CuSCN film was with high transmittance (≥85%) in the visible optical range and the direct transition band gap was 3.7 eV.

关 键 词:硫氰酸亚铜    纳米晶太阳能电池    电化学沉积机理    宽禁带p型半导体
文章编号:1001-4861(2005)03-0383-06
收稿时间:2004/6/21 0:00:00
修稿时间:9/6/2004 12:00:00 AM

Preparation and Mechanism of CuSCN Film by Electrodeposition in Aqueous Solution
WU Wei-Bing,JIN Zheng-Guo,HUA Zhen,FU Ya-Nan and QIU Ji-Jun.Preparation and Mechanism of CuSCN Film by Electrodeposition in Aqueous Solution[J].Chinese Journal of Inorganic Chemistry,2005,21(3):383-388.
Authors:WU Wei-Bing  JIN Zheng-Guo  HUA Zhen  FU Ya-Nan and QIU Ji-Jun
Institution:Key Laboratory for Advanced Ceramics and Machining Technology of Ministry of Education, School of Materials, Tianjin University, Tianjin 300072,Key Laboratory for Advanced Ceramics and Machining Technology of Ministry of Education, School of Materials, Tianjin University, Tianjin 300072,Key Laboratory for Advanced Ceramics and Machining Technology of Ministry of Education, School of Materials, Tianjin University, Tianjin 300072,Key Laboratory for Advanced Ceramics and Machining Technology of Ministry of Education, School of Materials, Tianjin University, Tianjin 300072 and Key Laboratory for Advanced Ceramics and Machining Technology of Ministry of Education, School of Materials, Tianjin University, Tianjin 300072
Abstract:
Keywords:cuprous(I)thiocyanate  NPC  electrodeposition  p-type simconductor  
本文献已被 CNKI 万方数据 等数据库收录!
点击此处可从《无机化学学报》浏览原始摘要信息
点击此处可从《无机化学学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号