Summary: New positive‐type photoresist systems based on enzymatically synthesized polyphenols have been developed. The photoresist thin film consisting of the polyphenol and a diazonaphthoquinone derivative was prepared on copperfoil‐coated epoxy resins and exposed to UV light with different doses. The polyphenols from the bisphenol monomers exhibited high photosensitivity, comparable with a conventional cresol novolac. The sensitivity could be controlled by changing the structure of the polyphenols. Furthermore, the present photoresist showed excellent etching resistance.
Characteristic exposure curves of poly( 1 )/DNQ and poly( 5 )/DNQ (both 70:30 wt.‐%) with different phenylene unit contents.
