| VHF-PECVD制备微晶硅薄膜及其微结构表征研究 |
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| 引用本文： | 张晓丹,高艳涛,赵颖,朱锋,魏长春,孙建,耿新华,熊绍珍.VHF-PECVD制备微晶硅薄膜及其微结构表征研究[J].人工晶体学报,2005,34(3):475-478. |
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| 作者姓名： | 张晓丹 高艳涛 赵颖 朱锋 魏长春 孙建 耿新华 熊绍珍 |
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| 作者单位： | 南开大学光电子薄膜器件与技术研究所,天津,300071;天津市光电子薄膜器件与技术重点实验室,天津,300071;光电信息技术科学教育部重点实验室(南开大学,天津大学)天津,300071 |
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| 基金项目： | 国家重点基础研究发展规划(No.G2000028202,G2000028203)，教育部重点项目(No.02167)，国家高技术研究发展计划(No.2002303261)资助 |
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| 摘 要： | 采用VHF-PECVD技术制备了系列不同衬底温度的硅薄膜.运用微区拉曼散射(Micro-Raman)和X射线衍射(XRD)对薄膜进行了结构方面的测试分析.Micro-Raman测试结果表明:随衬底温度的升高,薄膜逐渐由非晶向微晶过渡,晶化率(Xc)逐渐增大.XRD的结果显示样品的择优取向随衬底温度的升高而变化,(220)方向计算得出样品的晶粒尺寸逐渐变大.
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| 关 键 词： | 甚高频等离子体增强化学气相沉积(VHF-PECVD) 微晶硅 衬底温度 |
| 文章编号： | 1000-985X(2005)03-0475-04 |
Fabrication of Microcrystalline Silicon Films by VHF-PECVD and Their Microstructure Study |
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| ZHANG Xiao-dan,GAO Yan-tao,ZHAO Ying,ZHU Feng,WEI Chang-chun,SUN Jian,GENG Xin-hua,XIONG Shao-zhen.Fabrication of Microcrystalline Silicon Films by VHF-PECVD and Their Microstructure Study[J].Journal of Synthetic Crystals,2005,34(3):475-478. |
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| Authors: | ZHANG Xiao-dan GAO Yan-tao ZHAO Ying ZHU Feng WEI Chang-chun SUN Jian GENG Xin-hua XIONG Shao-zhen |
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| Abstract: | A series of microcrystalline silicon films prepared at the different substrate temperature(Ts)using VHF-PECVD were analyzed by micro-Raman spectroscopy and X-ray diffraction.The results of micro-Raman spectroscopic measurement evidently showed that the structures of samples evaluated from amorphous to microcrystalline with the increase of Ts.The preferable direction derived from XRD measurement gradually changed with the increase of Ts.The higher Ts gives, the larger grain sizes are. |
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| Keywords: | very high frequency plasma enhanced chemical vapor deposition microcrystalline silicon substrate temperature |
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