| 微晶硅薄膜纵向不均匀性的Raman光谱和AFM研究 |
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| 引用本文： | 张晓丹,赵颖,朱锋,魏长春,吴春亚,高艳涛,孙建,侯国付,耿新华,熊绍珍.微晶硅薄膜纵向不均匀性的Raman光谱和AFM研究[J].人工晶体学报,2004,33(6):960-964. |
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| 作者姓名： | 张晓丹 赵颖 朱锋 魏长春 吴春亚 高艳涛 孙建 侯国付 耿新华 熊绍珍 |
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| 作者单位： | 南开大学光电子薄膜器件与技术研究所,天津,300071;南开大学光电子薄膜器件与技术天津市重点实验室,天津,300071,光电信息技术科学教育部重点实验室(南开大学,天津大学),天津,300071 |
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| 基金项目： | 国家“973”重大基础研究项目 (No.G2 0 0 0 0 2 82 0 2，G2 0 0 0 0 2 82 0 3)，教育部项目 (No .0 2 16 7)，国际合作项目 (No .2 0 0 2DFG0 0 0 5 1)，“86 3”重大项目 (No .2 0 0 2 30 32 6 1)资助 |
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| 摘 要： | 本文研究了采用VHF-PECVD技术制备的微晶硅薄膜的纵向均匀性.喇曼测试结果显示:微晶硅薄膜存在着生长方向的结构不均匀,随厚度的增加,材料的晶化率逐渐变大;不同衬底其非晶孵化点是不一样的,对于同一种衬底,绒度大相应的晶化率就大,对应着孵化层的厚度小;AFM测试结果明显的给出:材料的结构随厚度增加发生变化.
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| 关 键 词： | 甚高频等离子体增强化学气相沉积 纵向均匀性 微晶硅薄膜 |
| 文章编号： | 1000-985X(2004)06-0960-05 |
Study of Vertical Non-uniformity of Microcrystalline Silicon Thin Film Using Raman Spectra and AFM |
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| ZHANG Xiao-dan,ZHAO Ying,ZHU Feng,WEI Chang-chun,WU Chun-ya,GAO Yan-tao,SUN Jian,HOU Guo-fu,GENG Xin-hua,XIONG Shao-zhen.Study of Vertical Non-uniformity of Microcrystalline Silicon Thin Film Using Raman Spectra and AFM[J].Journal of Synthetic Crystals,2004,33(6):960-964. |
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| Authors: | ZHANG Xiao-dan ZHAO Ying ZHU Feng WEI Chang-chun WU Chun-ya GAO Yan-tao SUN Jian HOU Guo-fu GENG Xin-hua XIONG Shao-zhen |
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| Abstract: | Non-uniformity of microcrystalline silicon thin film deposited by VHF-PECVD along the growth direction was studied. The results of Raman showed that the structure of microcrystalline silicon thin film existed non-uniformity along the growth direction.Crystalline volume fraction (Xc) gradually increased with the increase of thickness.The position of incubation was different for different substrates. As for the same substrate, the larger texture means the higher Xc. The results of AFM measurements also demonstrate that the structure of materials changes with the increase of thickness. |
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| Keywords: | very high frequency plasma enhanced chemical vapor deposition(VHF-PECVD) vertical non-uniformity microcrystalline silicon thin film |
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