| 溅射环境下基片表面所受到的轰击能量研究 |
| |
| 引用本文： | 李洪涛,蒋百灵,杨波,曹政.溅射环境下基片表面所受到的轰击能量研究[J].人工晶体学报,2011,40(3). |
| |
| 作者姓名： | 李洪涛 蒋百灵 杨波 曹政 |
| |
| 作者单位： | 西安理工大学材料科学与工程学院,西安,710048 |
| |
| 基金项目： | 陕西省重点学科建设专项资金; 西安理工大学优秀博士学位论文研究基金(101-210905)资助项目 |
| |
| 摘 要： | 溅射环境下基于薄膜的沉积速率和Langmuir探针测出的基片位置处离子流通量量化了单位时间内基片表面微区所接受的溅射中性原子的轰击能量Ec1和各种轰击离子传递给基片的轰击能量Ec2;Ec1和Ec2的数量级近似相同,Ec1和Ec2同时作用于基片表面微区加速了薄膜沉积过程中最表层原子的表面扩散进程,Ec1和Ec2持续作用所引起的能量积淀和温升效应可促进薄膜表层下方原子的体扩散进程。
|
| 关 键 词： | 溅射 Langmuir探针 轰击能量 微观形貌 |
Study on Bombardment Energy Received by Substrate Surface in Sputtering Environment |
| |
| LI Hong-tao,JIANG Bai-ling,YANG Bo,CAO Zheng.Study on Bombardment Energy Received by Substrate Surface in Sputtering Environment[J].Journal of Synthetic Crystals,2011,40(3). |
| |
| Authors: | LI Hong-tao JIANG Bai-ling YANG Bo CAO Zheng |
| |
| Institution: | LI Hong-tao,JIANG Bai-ling,YANG Bo,CAO Zheng(School of Materials Science and Engineering,Xi'an University of Technology,Xi'an 710048,China) |
| |
| Abstract: | Based on deposition rate of thin film and ion flux measured by Langmuir probe in sputtering environment,bombardment energy Ec1 of sputtered neutral atoms and bombardment energy Ec2 of bombardment ions accepted by substrate surface micro-area per unit time were calculated.The magnitude of Ec1 and Ec2 was approximately the same,surface diffusing processes of the top later atoms in the thin film were accelerated by the simultaneity action of Ec1 and Ec2,bulk diffusion processes of the atoms under the top layer... |
| |
| Keywords: | sputtering Langmuir probe bombardment energy morphology |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
