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CdSe单晶体的生长及其特性研究
引用本文:邵双运,金应荣,朱世富,赵北君,宋芳,王学敏,朱兴华.CdSe单晶体的生长及其特性研究[J].人工晶体学报,2001,30(2):119-122.
作者姓名:邵双运  金应荣  朱世富  赵北君  宋芳  王学敏  朱兴华
作者单位:四川大学材料科学系,
基金项目:教育部重点科技项目和高等学校骨干教师资助计划
摘    要:本文报道了用改进的垂直气相法(多级提纯垂直气相法)生长富Cd的CdSe单晶体,并对晶体的性能进行了观测,其电阻率为107Ωcm量级,电子陷阱浓度为108cm-3量级,第一次报道了(110)面的腐蚀形貌。结果表明:采用这种方法制备CdSe单晶,设备简单,易于操作,在提纯和生长过程中不需要转移原料,有利于减少晶体中的杂质含量,降低位错密度,改善晶体的电学性能。多级提纯垂直气相法是一种有前途的CdSe单晶体生长的新方法。

关 键 词:CdSe单晶体  多级提纯  气相生长  电阻率  
文章编号:1000-985X(2001)02-0119-04
修稿时间:2000年12月18

Growth and Characterization of CdSe Single Crystals
SHAO Shuang-yun,JIN Ying-rong,ZHU Shi-fu,ZHAO Bei-Jun,SONG Fang,WANG Xue-min,ZHU Xing-hua.Growth and Characterization of CdSe Single Crystals[J].Journal of Synthetic Crystals,2001,30(2):119-122.
Authors:SHAO Shuang-yun  JIN Ying-rong  ZHU Shi-fu  ZHAO Bei-Jun  SONG Fang  WANG Xue-min  ZHU Xing-hua
Abstract:High quality CdSe single crystals with excess Cd(10mm in diameter and 45mm in length) were grown using modified sublimation technique,i.e.vertical unseeded vapor growth with multi-step purification.Purification of polycrystalline material and growth of CdSe single crystals were carried on in the same quartz ampoule.The resistivity of the crystal was measured to be of 107—108Ω cm order,and the electron trap densities of 108cm-3.The etch pit patterns of (110)face was reported for the first time.The results showed that this was a new and promising method for growing high quality CdSe single crystals.
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