| 不同缓冲层对ZnO薄膜的性能影响 |
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| 引用本文： | 侯丽莉,马书懿,陈海霞,孟军霞,贾迎飞,陶亚明,尚小荣.不同缓冲层对ZnO薄膜的性能影响[J].人工晶体学报,2010,39(3):644-648. |
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| 作者姓名： | 侯丽莉 马书懿 陈海霞 孟军霞 贾迎飞 陶亚明 尚小荣 |
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| 作者单位： | 西北师范大学物理与电子工程学院,兰州,730070 |
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| 基金项目： | 国家自然科学基金，甘肃省自然科学基金，甘肃省高分子材料重点实验室开放基金 |
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| 摘 要： | 用射频反应磁控溅射法在玻璃基底上分别以SnO2、SiO2和Al2O3为缓冲层制备ZnO薄膜.利用X射线衍射仪(XRD)、扫描电镜(SEM)、紫外-可见分光光度计和荧光分光光度计对薄膜的结构和光学性能进行了表征.XRD和SEM的分析结果表明,在SiO2和Al2O3缓冲层上生长的ZnO薄膜具有较好的c轴择优取向,薄膜表面光滑平整,薄膜的结晶质量得到改善;透射光谱表明所有样品在可见光范围内的平均透过率超过70;;通过对薄膜光致发光谱的分析,认为422 nm左右的紫峰来自于电子从晶粒边界的界面缺陷能级到价带的辐射跃迁;PL谱中蓝光和绿光的发光机制与薄膜中的本征缺陷有关.
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| 关 键 词： | ZnO薄膜 缓冲层 晶体结构 光致发光 |
Effect of Different Buffer Layers on the Properties of ZnO Films |
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| HOU Li-li,MA Shu-yi,CHEN Hai-xia,MENG Jun-xia,JIA Ying-fei,TAO Ya-ming,SHANG Xiao-rong.Effect of Different Buffer Layers on the Properties of ZnO Films[J].Journal of Synthetic Crystals,2010,39(3):644-648. |
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| Authors: | HOU Li-li MA Shu-yi CHEN Hai-xia MENG Jun-xia JIA Ying-fei TAO Ya-ming SHANG Xiao-rong |
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| Institution: | HOU Li-li,MA Shu-yi,CHEN Hai-xia,MENG Jun-xia,JIA Ying-fei,TAO Ya-ming,SHANG Xiao-rong(College of Physics , Electronic Engineering,Northwest Normal University,Lanzhou 730070,China) |
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| Abstract: | ZnO films with SnO2,SiO2 and Al2O3 buffer layers were prepared on glass substrates by radio frequency magnetron sputtering method.The structure and optical properties of the ZnO films were characterized by XRD,SEM,UV-VIS spectrophotometer and fluorescence spectrophotometer.The results indicated that SiO2 and Al2O3 buffer layers with c axis preffered orientation have a smooth surface and the crystal quality of ZnO films improve.All samples show the average visible light transmittance above 70%.The violet lum... |
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| Keywords: | ZnO film buffer layer crystal structure photoluminescence |
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