| p型Cu2O 半导体薄膜的电化学沉积研究 |
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| 引用本文： | 胡飞,江毅,梁建.p型Cu2O 半导体薄膜的电化学沉积研究[J].人工晶体学报,2009,38(4):952-956. |
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| 作者姓名： | 胡飞 江毅 梁建 |
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| 作者单位： | 景德镇陶瓷学院,景德镇,333001 |
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| 基金项目： | 景德镇陶瓷学院博士启动经费，景德镇市科技局项目，江西省教育厅项目 [No.GJJ09531]资助 |
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| 摘 要： | 以透明导电玻璃(ITO)和铜片为工作电极,用简单铜盐通过阴极还原制备了Cu2O 薄膜.采用X射线衍射(XRD) 和扫描电镜(SEM)研究了反应温度、pH值和电流密度对Cu2O 薄膜的微观结构和表面形貌的影响,并对薄膜的生长机理进行了讨论.结果表明:溶液的温度对Cu2O晶体的微观结构无显著影响,而溶液的pH值对Cu2O 的生长取向影响明显.在双电极的作用下,电沉积Cu2O薄膜的工作电流可以达到6 mA·cm-2,远远高于文献报导在三电极体系下低于1 mA·cm-2的工作电流密度.
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| 关 键 词： | 氧化亚铜 电沉积 温度 电流密度 |
Research on Electrochemical Deposition of p-type Cu_2O Thin Films |
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| HU Fei,JIANG Yi,LIANG Jian.Research on Electrochemical Deposition of p-type Cu_2O Thin Films[J].Journal of Synthetic Crystals,2009,38(4):952-956. |
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| Authors: | HU Fei JIANG Yi LIANG Jian |
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| Institution: | Jingdezhen Ceramic Institute;Jingdezhen 333001;China |
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| Abstract: | Cu2O thin film was fabricated by electrochemical depositon using ITO and Cu strip as working electrode.The effect of temperatrue and pH value on the microstructure,surface morphology and current density of Cu2O thin films were studied by XRD and SEM,the growth mechanism was also discussed.The reults indicate that the temperature has little effect on the microstructure of Cu2O thin film,and the pH value has obvious influence on the preferential orientation.Under the action of double electrodeposition,the wor... |
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| Keywords: | Cu2O electrodeposition temperature current density |
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