| THERMODYNAMIC AND PARTICLE-DYNAMIC STUDIES ON SYNTHESIS OF SILICA NANOPARTICLES USING MICROWAVE-INDUCED PLASMA CVD |
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| 作者姓名： | Ruoyu Hong * Jianmin Ding and Guoliang Zheng College of Chemistry and Chemical Engineering Soochow University Suzhou P. R. China Institute of Process Engineering Chinese Academy of Sciences Beijing P. R. China IBM HYDA/- C Highway North Rochester MN USA *Author to whom correspondence should be addressed. E-mail: rhong@suda.edu.cn |
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| 作者单位： | Ruoyu Hong1，2，*，Jianmin Ding3 and Guoliang Zheng2 1College of Chemistry and Chemical Engineering，Soochow University，Suzhou 215006，P. R. China 2Institute of Process Engineering，Chinese Academy of Sciences，Beijing 100080，P. R. China 3IBM，HYDA/050-3 C202，3605 Highway 52 North，Rochester，MN 55901，USA *Author to whom correspondence should be addressed. E-mail: rhong@suda.edu.cn |
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| 摘 要： | 1. Introduction1.1 Silica nanoparticles and synthesis methods Silica (SiO2) nanoparticles are widely used in industry asan active filler for polymer reinforcement, a rheologicaladditive in fluids, a free flow agent in powders, and anagent for chemical mechanical polishing during IC (inte-grated circuit) fabrication (Sniegowski & de Boer, 2000).Silica powder is also used for producing silicon carbide(Koc & Cattamanchi, 1998) or opaque silica aerosols (Leeet al., 1995). Many methods can …
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| 关 键 词： | 微波 等离子体 化学蒸汽沉降法 纳米结构 二氧化硅 |
THERMODYNAMIC AND PARTICLE-DYNAMIC STUDIES ON SYNTHESIS OF SILICA NANOPARTICLES USING MICROWAVE-INDUCED PLASMA CVD |
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| Ruoyu Hong,,*,Jianmin Ding and Guoliang Zheng College of Chemistry and Chemical Engineering,Soochow University,Suzhou ,P. R. China Institute of Process Engineering,Chinese Academy of Sciences,Beijing ,P. R. China IBM,HYDA/- C, Highway North,Rochester,MN ,USA *Author to whom correspondence should be addressed. E-mail: rhong@suda.edu.cn.THERMODYNAMIC AND PARTICLE-DYNAMIC STUDIES ON SYNTHESIS OF SILICA NANOPARTICLES USING MICROWAVE-INDUCED PLASMA CVD[J].China Particuology,2004,2(5):207-214. |
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| Authors: | Ruoyu Hong Jianmin Ding and Guoliang Zheng College of Chemistry and Chemical Engineering Soochow University Suzhou P R China Institute of Process Engineering Chinese Academy of Sciences Beijing P R China IBM HYDA/- C Highway North Rochester MN USA Author to whom correspondence should be addressed E-mail: rhong@sudaeducn |
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| Institution: | Ruoyu Hong1,2,*,Jianmin Ding3 and Guoliang Zheng2 1College of Chemistry and Chemical Engineering,Soochow University,Suzhou 215006,P. R. China 2Institute of Process Engineering,Chinese Academy of Sciences,Beijing 100080,P. R. China 3IBM,HYDA/050-3 C202,3605 Highway 52 North,Rochester,MN 55901,USA *Author to whom correspondence should be addressed. E-mail: rhong@suda.edu.cn |
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| Abstract: | Recent studies on preparation of silica nanoparticles using plasma chemical vapor deposition (PCVD) are briefly reviewed. A microwave (MW) PCVD apparatus was set up to synthesize silica nanoparticles by the oxidation of silicon tetrachloride. Computations based on the minimization of Gibbs free energy were conducted to find the equilib- rium compositions, the optimal reaction temperature, the suitable mole ratio of oxygen to silicon tetrachloride, and the best inlet positions of silicon tetrachloride. The mean particle diameter and specific surface area were obtained from particle dynamic simulation. Experimental investigation verified the results obtained from the thermodynamic and parti- cle-dynamic computations, and showed that the maximum production rate of silica was more than 1 kg.h-1 with the full MW input power. |
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| Keywords: | microwave plasma chemical vapor deposition nanoparticle silica |
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