首页 | 本学科首页   官方微博 | 高级检索  
     检索      

基于斜向背散射偏振拉曼光谱的{100}c-Si面内应力分析
引用本文:孟田,柴俊杰,马路路,常颖,曲传咏,仇巍.基于斜向背散射偏振拉曼光谱的{100}c-Si面内应力分析[J].实验力学,2020(2):183-189.
作者姓名:孟田  柴俊杰  马路路  常颖  曲传咏  仇巍
作者单位:天津大学机械工程学院力学系;天津市现代工程力学重点实验室
基金项目:国家自然科学基金(11827802,11890682,11772223)资助。
摘    要:复杂应力状态下应力分量的解耦分析对半导体的设计和制造具有重要意义。本文开展了方法学研究,首先建立了{100}晶面族单晶硅面内应力分量解耦分析模型,基于该模型,通过改变入射光和散射光的几何构型和偏振构型,可得到单晶硅拉曼频移与应力分量的解析关系。在此基础上,提出了一种利用斜向背散射偏振拉曼光谱在不同倾角、偏振方向和样品旋转角度下开展原位拉曼探测实现应力分量解耦分析的实用技术。本文通过实验验证了该方法的可靠性和适用性。

关 键 词:{100}晶面族单晶硅  斜向背散射  显微拉曼光谱  面内应力  几何与偏振构型

In-plane stress analysis of{100}c-Si by oblique backscattering polarized Micro-Raman spectroscopy
MENG Tian,CHAI Jun-jie,MA Lu-lu,CHANG Ying,QU Chuan-yong,QIU Wei.In-plane stress analysis of{100}c-Si by oblique backscattering polarized Micro-Raman spectroscopy[J].Journal of Experimental Mechanics,2020(2):183-189.
Authors:MENG Tian  CHAI Jun-jie  MA Lu-lu  CHANG Ying  QU Chuan-yong  QIU Wei
Institution:(Department of Mechanical,School of the Mechanical Engineering,Tianjin University,Tianjin 300072,China;Tianjin Key Laboratory of Modern Engineering Mechanics,Tianjin 300072,China)
Abstract:The decoupling analysis of stress components under complex stress state is of great importance for the semiconductor design and manufacture.This paper presents an investigation of methodology by establishing a decoupling model of in-plane stress for monocrystalline silicon with{100}plane.Based on the decoupling model,the analytical relationship between Raman-shifts of monocrystalline silicon and stress components is obtained by changing the geometry and polarization configurations of incident and scattered lights.Moreover,a practicable technique decoupling stress components is proposed,by which Raman data are in-situ detected by an oblique backscattering polarized Raman spectroscopy at different inclination angles,polarization directions and sample rotation angles,respectively.In conclusion,the reliability and the applicability of proposed method are verified by experiments in this work.
Keywords:{100}c-Si  oblique backscattering  Micro-Raman spectroscopy  in-plane stress  geometry and polarization configuration
本文献已被 CNKI 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号