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An analysis of the effect of the solid layer for the modified chemical vapor deposition process
Authors:Y T Lin  M Choi  R Greif
Institution:(1) Yvan-Ze Institute of Technology, Chung-Li, Taiwan;(2) Seoul National University, Seoul, South Korea;(3) Department of Mechanical Engineering, University of California at Berkeley, 94720 Berkeley, CA, USA
Abstract:The heat transfer problem relative to the modified chemical vapor deposition process has been analyzed and the effects of solid layer thickness, torch speed and tube rotation are studied. The quasi-steady three-dimensional energy equations have been solved for the temperature fields in the gas and the solid layer with a Gaussian heat flux boundary condition on the outer surface. Of particular interest is the effect of the solid layer thickness and the torch speed on inner surface temperature, gas temperature and thermophoretic velocity. The large change of the axial temperature distribution of the surface occurs for different solid layer thicknesses or torch speeds. The presence of the solid layer and tube rotation reduce the effects of nonuniform torch heating in the circumferential direction and the resulting surface temperatures are very uniform in this direction.
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