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直流法制备类富勒烯碳氢薄膜的摩擦学性能研究
引用本文:欧玉静,郭俊猛,王永富,高凯雄,梁爱民,张斌,张俊彦.直流法制备类富勒烯碳氢薄膜的摩擦学性能研究[J].摩擦学学报,2015,35(1):82-89.
作者姓名:欧玉静  郭俊猛  王永富  高凯雄  梁爱民  张斌  张俊彦
作者单位:兰州理工大学, 甘肃 兰州 730000;1. 兰州理工大学, 甘肃 兰州 730000;2. 中国科学院兰州化学物理研究所 固体润滑国家重点实验室, 甘肃 兰州 730000;中国科学院兰州化学物理研究所 固体润滑国家重点实验室, 甘肃 兰州 730000;中国科学院兰州化学物理研究所 固体润滑国家重点实验室, 甘肃 兰州 730000;中国科学院兰州化学物理研究所 固体润滑国家重点实验室, 甘肃 兰州 730000;中国科学院兰州化学物理研究所 固体润滑国家重点实验室, 甘肃 兰州 730000;中国科学院兰州化学物理研究所 固体润滑国家重点实验室, 甘肃 兰州 730000
基金项目:国家973项目(2013CB632304)和国家自然科学基金(51275508、51205383)资助.
摘    要:采用直流等离子体化学气相沉积(dc-PECVD)技术,以甲烷为前驱体,在单晶硅表面制备了含氢类富勒烯(FL-C∶H)薄膜.简化了含氢类富勒烯(FL-C∶H)薄膜的脉冲偏压协助等离子体化学气相制备过程(mcPECVD),通过高分辨率透射电镜和拉曼光谱确定了FL-C∶H薄膜的微观结构和薄膜内的富勒烯含量;通过纳米压痕和往复摩擦试验对比了两种方法制备的FL-C∶H与传统的DLC薄膜的硬度及摩擦性能.结果表明:与用脉冲偏压协助方案制备的含氢类富勒烯薄膜相比,直流方案制备的FL-C∶H薄膜具有相似的微观结构,更优异的机械特性及摩擦学性能,同时该薄膜表现出对载荷、频率和相对湿度的低敏感性.

关 键 词:直流  类富勒烯  脉冲偏压协助  低敏感性

Tribological Performance of Fullerene-like Hydrogenated Carbon Films Prepared by Direct Current Method
OU Yu-jing,GUO Jun-meng,WANG Yong-fu,GAO Kai-xiong,LIANG Ai-min,ZHANG Bin and ZHANG Jun-yan.Tribological Performance of Fullerene-like Hydrogenated Carbon Films Prepared by Direct Current Method[J].Tribology,2015,35(1):82-89.
Authors:OU Yu-jing  GUO Jun-meng  WANG Yong-fu  GAO Kai-xiong  LIANG Ai-min  ZHANG Bin and ZHANG Jun-yan
Institution:School of Petrochemical Engineering, Lanzhou University of Technology, Lanzhou 730000, China;1. School of Petrochemical Engineering, Lanzhou University of Technology, Lanzhou 730000, China;2. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China;State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China;State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China;State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China;State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China;State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China
Abstract:Hydrogenated fullerene-like carbon (FL-C:H) films were deposited on Si(100) substrates by a direct current plasma enhanced chemical vapor deposition(dc-PECVD) technique using pure CH4 as feedstock. Simplify the hydrogen fullerene (FL-C: H) films prepared by pulsed bias-assisted plasma chemical vapor process (mc-PECVD). The microstructures and the FL content of the FL-C:H films were characterized by high transmission electron microscopy and Raman spectrum. The mechanical properties and friction behaviors of the films were investigated by using a Nano-indenter and a ball-on-disk tester. Results show that compared with the hydrogen-containing fullerene-like films prepared by pulse bias-assisted method,FL-C:H films prepared by dc method that exhibited a similar microstructure,superior excellent mechanical properties and tribological performance,and these films showed low sensitivity to load,frequency and relative humidity.
Keywords:direct current  fullerene-like  pulse bias-assisted  low sensitivity
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