退火温度对氧化铬薄膜结构和高温摩擦学性能的影响 |
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引用本文: | 刘晓红,卢小伟,何乃如,吉利,李红轩,周惠娣,陈建敏.退火温度对氧化铬薄膜结构和高温摩擦学性能的影响[J].摩擦学学报,2019,39(2):164-170. |
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作者姓名: | 刘晓红 卢小伟 何乃如 吉利 李红轩 周惠娣 陈建敏 |
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作者单位: | 1.中国科学院兰州化学物理研究所 固体润滑国家重点实验室,甘肃 兰州 730000 |
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基金项目: | 国家自然科学基金项目(51505461)、国家973项目(2013CB632300)和中国科学院资助 |
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摘 要: | 采用电弧离子镀技术在GH-4169高温合金基体上沉积氧化铬薄膜,并对薄膜进行了不同温度的退火处理,系统研究了不同退火温度(500、600、700和800 ℃)对薄膜形貌、薄膜结构、薄膜力学性能及薄膜摩擦学性能的影响. 结果表明:随退火温度升高,薄膜表面缺陷减少,氧化铬晶化趋于完善,薄膜硬度下降. 高温摩擦学性能方面薄膜经500和600 ℃退火后,在环境温度从室温到800 ℃宽温域范围内摩擦系数较退火前均有所增加;经800 ℃退火后的薄膜在环境温度为400~600 ℃时的摩擦系数均明显下降,但室温摩擦系数明显升高,宽温域内摩擦系数波动较大;700 ℃退火后薄膜宽温域内摩擦系数在0.21~0.33之间,波动较小.
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关 键 词: | 氧化铬薄膜 退火 电弧离子镀 高温 摩擦学性能 |
收稿时间: | 2018-12-03 |
Influence of Annealing Temperature on Structure and High Temperature Tribological Properties of Chromium oxide Films |
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Institution: | 1.State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Gansu Lanzhou 730000, China2.Graduate University of Chinese Academy of Sciences, Beijing 100049, China |
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Abstract: | Chromium oxide thin film was deposited on GH-4169 alloy by arc ion plating (AIP). The effects of annealing temperature (500 ℃, 600 ℃, 700 ℃ and 800 ℃) on morphology, structure, mechanical properties and tribological properties were studied . The results showed that the chromium oxide film presented a decreasing defect density and hardness, and gradually perfect crystallinity, as the annealing temperature increased. In addition, chromium oxide films annealing at different temperatures presented different high temperature tribological properties: chromium oxide films annealing at 500 ℃ and 600 ℃ showed a higher friction coefficient than one as-deposited from 25 ℃ to 800 ℃; chromium oxide films annealing at 800 ℃ showed a relatively low friction coefficient from 400 ℃ to 600 ℃, while a high friction coefficient (>0.4) at room temperature, which indicated a obvious fluctuation over a wide range of temperature; chromium oxide films annealing at 700 ℃ showed a stable friction coefficient (0.21~0.33) from 25 ℃ to 800 ℃. |
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