| 原子层沉积氧化铝薄膜摩擦学性能研究 |
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| 引用本文： | 王莹,杨静,袁宁一,丁建宁,夏丽,谭成邦.原子层沉积氧化铝薄膜摩擦学性能研究[J].摩擦学学报,2013,33(2):177-183. |
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| 作者姓名： | 王莹 杨静 袁宁一 丁建宁 夏丽 谭成邦 |
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| 作者单位： | 常州大学低维材料微纳器件与系统研究中心,江苏常州213164;常州大学太阳能电池材料与技术江苏省重点实验室,江苏常州213164 |
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| 基金项目： | 国家自然科学基金(NSFC 51102028)、固体润滑国家重点实验室开放基金(1006)和江苏省高校优势学科建设项目资助. |
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| 摘 要： | 不同温度条件下,采用原子层沉积(ALD)技术在单晶硅基底表面制备了Al2O3薄膜.利用原子力显微镜观察了Al2O3薄膜的表面形貌和粗糙度,利用纳米压痕仪测定了薄膜的硬度,并通过UMT-2型往复摩擦磨损试验机(球-盘接触方式)考察了制备温度、载荷和对偶球对Al2O3薄膜的摩擦学性能的影响.结果表明:不同温度条件下制备得到的Al2O3薄膜的粗糙度不同；制备温度为100和200℃的Al2O3薄膜的摩擦性能较优；在所用载荷范围内,摩擦系数存在最低值；与不同对偶球对摩时,由于对偶球硬度不同,Al2O3薄膜呈现不同的摩擦磨损现象.
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| 关 键 词： | Al2O3薄膜 原子层沉积 制备温度 对偶球 摩擦磨损 |
Tribological Properties of Alumina Films Fabricated by Atomic Layer Deposition |
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| WANG Ying,YANG Jing,YUAN Ning-yi,DING Jian-ning,XIA Li and TAN Cheng-bang.Tribological Properties of Alumina Films Fabricated by Atomic Layer Deposition[J].Tribology,2013,33(2):177-183. |
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| Authors: | WANG Ying YANG Jing YUAN Ning-yi DING Jian-ning XIA Li and TAN Cheng-bang |
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| Institution: | 1. Center for Low-dimensional Materials, Micro-nano Devices and System, Changzhou University, Changzhou 213164, China;2. Jiangsu Key Laboratory for Solar Cell Materials and Technology, Changzhou 213164, China;1. Center for Low-dimensional Materials, Micro-nano Devices and System, Changzhou University, Changzhou 213164, China;2. Jiangsu Key Laboratory for Solar Cell Materials and Technology, Changzhou 213164, China;1. Center for Low-dimensional Materials, Micro-nano Devices and System, Changzhou University, Changzhou 213164, China;2. Jiangsu Key Laboratory for Solar Cell Materials and Technology, Changzhou 213164, China;1. Center for Low-dimensional Materials, Micro-nano Devices and System, Changzhou University, Changzhou 213164, China;2. Jiangsu Key Laboratory for Solar Cell Materials and Technology, Changzhou 213164, China;1. Center for Low-dimensional Materials, Micro-nano Devices and System, Changzhou University, Changzhou 213164, China;2. Jiangsu Key Laboratory for Solar Cell Materials and Technology, Changzhou 213164, China;1. Center for Low-dimensional Materials, Micro-nano Devices and System, Changzhou University, Changzhou 213164, China;2. Jiangsu Key Laboratory for Solar Cell Materials and Technology, Changzhou 213164, China |
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| Abstract: | |
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| Keywords: | alumina film atomic layer deposition preparation temperature counterpart ball friction and wear |
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