含纳米粒子溶液对单晶硅表面的冲蚀磨损损伤实验研究

利用高分辨透射电子显微镜和原子力显微镜观察了含纳米颗粒溶液冲蚀硅片表面损伤行为,考察了纳米颗粒碰撞单晶硅片所导致的微观物理损伤.结果表明:冲蚀30 s后,在高分辨透射电子显微镜下可见硅片表面呈现方向性损伤,并可观察到大量非均匀的晶格缺陷;当冲蚀10 min时,硅片表面出现微观划痕和凹坑,在划痕一端可见原子堆积,亚表面可观察到镶嵌晶粒的非晶损伤层;继续延长冲蚀时间将加剧其表面损伤.

An Investigation on the Monocrystalline Silicon Surface Damage Caused by Slurry Erosion

Experiment on cylindrical liquid jet containing de-ionized water and SiO, nanoparticles impacting obliquely on a single crystal silicon surface at a speed of 50 m/s was perforrned. Microstructure of the impacted silicon surface was examined through a high resolution transmission electron microscopy, an atomic force microscopy, etc. Some crystaI defects, lattice distortion, and grain refinement and rotation of grains in the surface layer after exposing for 30 seconds have been observed. At exposure time of 10 minutes, an amorphous layer containing a few of crystal grains exhibits in the subsurface, and lots of craters, scratches, and atom pileups can be found in the surface. Surface damage aggravated with increase of exposure time.