直流射频等离子体增强化学气相沉积类金刚石碳薄膜的结构及摩擦学性能研究

利用直流射频等离子增强化学气相沉积技术在单晶硅表面制备了类金刚石碳薄膜．采用Raman光谱、红外光谱、x射线光电子能谱和原子力显微镜等研究了薄膜的微观结构和表面形貌,在UMT-2MT型摩擦磨损试验机上考察了薄膜在不同载荷与滑动速度下的摩擦学性能。结果表明：所制备的类金刚石碳薄膜具有典型的类金刚石结构特征,薄膜均匀、致密,表面粗糙度小,硬度较高;薄膜与Si3N4陶瓷球对摩时显示出良好的抗磨减摩性能;随着试验载荷与滑动速度的提高,薄膜的摩擦系数降低,耐磨寿命降低;薄膜的减摩抗磨性能同其在Si3N4陶瓷球偶件磨损表面形成的转移膜相关。

Structure and Tribological Properties of DLC Films Deposited by DC-RF-PECVD

Diamond-like carbon films were successfully deposited on Si substrate by direct current radio frequency plasma enhanced chemical vapor deposition (DC-RF-PECVD). The microstructure and morphology of the DLC film were investigated by means of Raman spectroscopy, X-ray photoelectron spectroscopy, infrared spectrometry, and atomic force microscopy. The friction and wear behaviors of the DLC film sliding against a Si_3N_4 ball at different loads and velocities were examined on a UMT-2MT test rig. The morphologies of the wear scar of the film and of the counterpart Si_3N_4 ball were observed on a scanning electron microscope. It was found that the film prepared by DC-RF-PECVD had typical hydrogenated diamond-like characteristics and was very much smooth and compact. It showed good friction-reducing and antiwear behavior as sliding against a Si_3N_4 ball, while the applied load and sliding velocity had great effects on the friction and wear behavior of the DLC film. Moreover, the friction and wear behavior of the DLC film was also dependent on its transfer film formed on the worn surface of the counterpart Si_3N_4 ball.