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添加TiN对MoS2基复合薄膜结构和性能的影响
引用本文:李倩倩,尹桂林,郑慈航,余震,何丹农.添加TiN对MoS2基复合薄膜结构和性能的影响[J].摩擦学学报,2011,31(1):40-44.
作者姓名:李倩倩  尹桂林  郑慈航  余震  何丹农
作者单位:1. 上海交通大学,材料科学与工程学院,上海,200240;纳米技术及应用国家工程研究中心,上海,200241
2. 纳米技术及应用国家工程研究中心,上海,200241
3. 上海交通大学,材料科学与工程学院,上海,200240
基金项目:国家自然科学基金项目(50675131)
摘    要:通过磁控反应溅射方法制备MoSx-TiN复合薄膜,研究添加少量TiN对MoS2基薄膜结构和性能的影响。薄膜的结构和性能通过X射线光电子能谱仪(XPS)、X射线衍射仪(XRD)、场发射扫描电子显微镜(FESEM)及UMT-2多功能微摩擦磨损试验机等进行了表征。结果表明:与纯MoS2薄膜相比,少量TiN的添加使得MoSx-TiN复合薄膜(002)晶面择优取向且结构致密。与纯MoS2和MoS2-Ti薄膜相比,MoSx-TiN复合薄膜在潮湿大气条件下具有更优异的摩擦磨损性能,更低的摩擦系数。

关 键 词:MoS2  TiN  磁控反应溅射  摩擦磨损性能
收稿时间:5/4/2010 12:00:00 AM
修稿时间:7/2/2010 12:00:00 AM

Effect of TiN Addition on the Microstructure and Performance of MoS2-based Composite Films
LI Qian-qian,YIN Gui-lin,ZHENG Ci-hang,YU Zhen and HE Dan-nong.Effect of TiN Addition on the Microstructure and Performance of MoS2-based Composite Films[J].Tribology,2011,31(1):40-44.
Authors:LI Qian-qian  YIN Gui-lin  ZHENG Ci-hang  YU Zhen and HE Dan-nong
Institution:LI Qian-qian1,2,YIN Gui-lin2,ZHENG Ci-hang1,YU Zhen1,HE Dan-nong1,2(1.College of Materials Science and Engineering,Shanghai Jiaotong University,Shanghai 200240,China2.National Engineering Research Center of Nanotechnology,Shanghai 200241,China)
Abstract:MoSx-TiN composite films were prepared by magnetron reaction-sputtering. The effect of small amount of TiN on the microstructure and performance of MoS2 -based film was studied. The structure and properties of films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and UMT-2 multi-functional tribometer. Experimental results indicated that, compared with pure MoS2 film, MoSx-TiN composite film had a stronger preferential orientation of crystal plane (002) and a compact microstructure. The MoSx-TiN composite film exhibited better tribological properties than that of pure MoS2 and MoS2-Ti films in humid air at room temperature.
Keywords:MoS2  TiN  magnetron reaction-sputtering  tribological property
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