| 直流磁控溅射制备TiAlCN薄膜及其性能研究 |
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| 引用本文： | 郑建云,郝俊英,刘小强,龚秋雨,刘维民.直流磁控溅射制备TiAlCN薄膜及其性能研究[J].摩擦学学报,2013,33(1):85-90. |
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| 作者姓名： | 郑建云 郝俊英 刘小强 龚秋雨 刘维民 |
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| 作者单位： | 1. 中国科学院兰州化学物理研究所 固体润滑国家重点实验室,甘肃 兰州 730000;2. 中国科学院大学,北京 100049;中国科学院兰州化学物理研究所 固体润滑国家重点实验室,甘肃 兰州 730000;1. 中国科学院兰州化学物理研究所 固体润滑国家重点实验室,甘肃 兰州 730000;2. 中国科学院大学,北京 100049;1. 中国科学院兰州化学物理研究所 固体润滑国家重点实验室,甘肃 兰州 730000;2. 中国科学院大学,北京 100049;中国科学院兰州化学物理研究所 固体润滑国家重点实验室,甘肃 兰州 730000 |
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| 基金项目： | 国家自然科学基金(50905177)资助. |
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| 摘 要： | 采用直流磁控溅射技术制备TiAlCN薄膜,研究了直流电流对TiAlCN薄膜的薄膜成分、微观结构、机械性能和摩擦性能的影响.研究表明:随着直流电流的增加,薄膜中C元素含量逐渐降低;薄膜中无定形碳含量减少,而(Ti,Al)CxN1-x晶粒增加.另外,在低于3.0 A直流电流范围内薄膜的表面粗糙度无明显变化,而当直流电流高于3.0 A时,薄膜的表面粗糙度随直流电流的增加而显著上升.随着直流电流的增大,薄膜的硬度先增加后降低,而薄膜的摩擦系数则先降低后升高.在直流电流为3.5 A时,薄膜的硬度和摩擦系数分别约为22.2 GPa和0.16.
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| 关 键 词： | 直流磁控溅射 TiAlCN薄膜 微观结构 硬度 摩擦行为 |
| 收稿时间： | 5/1/2001 12:00:00 AM |
| 修稿时间： | 6/8/2001 12:00:00 AM |
Properties of TiAlCN Films Prepared by Direct Current Magnetron Sputtering |
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| ZHENG Jian-yun,HAO Jun-ying,LIU Xiao-qiang,GONG Qiu-yu and LIU Wei-min.Properties of TiAlCN Films Prepared by Direct Current Magnetron Sputtering[J].Tribology,2013,33(1):85-90. |
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| Authors: | ZHENG Jian-yun HAO Jun-ying LIU Xiao-qiang GONG Qiu-yu and LIU Wei-min |
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| Institution: | 1. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China;2. Graduate School of Chinese Academy of Sciences, Beijing 100049, China;State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China;1. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China;2. Graduate School of Chinese Academy of Sciences, Beijing 100049, China;1. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China;2. Graduate School of Chinese Academy of Sciences, Beijing 100049, China;State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China |
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| Abstract: | TiAlCN films were deposited by direct current magnetron sputtering in order to study the composition, microstructure, mechanical and tribological properties as a function of direct current. The results show that with the increase of the direct current, the relative contents of element C reduced gradually, the contents of the amorphous carbon in the film decreased and the (Ti,Al)CxN1-x crystal grain increased. In addition, the surface roughness of the film was almost steady under a direct current of 3 A, and conversely, the surface roughness of the film increased suddenly as the direct current was increased. With the increment of the direct current, the hardness of the film increased firstly and then decreased, however the friction coefficient of the film decreased firstly and then increased. At the direct current of 3.5 A, the hardness and friction coefficient of the TiAlCN film were about 22.2 GPa and 0.16, respectively. |
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| Keywords: | direct current magnetron sputtering TiAlCN films microstructure hardness tribological behaviours |
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