| TA2表面磁控溅射CNx/SiC薄膜的纳米压痕与摩擦磨损性能 |
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| 引用本文： | 许晓静,卓刘成,夏登福,韦宝存,郝欣妮.TA2表面磁控溅射CNx/SiC薄膜的纳米压痕与摩擦磨损性能[J].摩擦学学报,2009,29(3). |
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| 作者姓名： | 许晓静 卓刘成 夏登福 韦宝存 郝欣妮 |
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| 作者单位： | 江苏大学,先进成形技术研究所,江苏,镇江,212013
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| 基金项目： | 江苏大学优秀学术青年骨干培养对象基金，江苏省摩擦学重点实验室基金 |
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| 摘 要： | 采用室温磁控溅射技术在工业纯钛(TA2)表面制备出氮化碳/碳化硅(CNx/SiC)双层薄膜,SiC为中间层.研究了CNx薄膜的纳米压痕行为和摩擦磨损性能.试验结果表明:CNx薄膜的纳米硬度(H)为15.80 GPa,杨氏弹性模量(E)为130.88 GPa,硬度与弹性模量比值(H/E)为0.121;与φ4mm的氮化硅球对摩,在载荷1.96 N、室温Kokubo人体模拟体液条件下,CNx薄膜的磨损速率为10-6mm3/(m·N)级,摩擦系数约为0.124,磨损后薄膜未出现裂纹和剥落.分析表明,薄膜具有的良好抗磨性能与其H/E高、抗腐蚀性强以及摩擦系统摩擦系数低相一致.
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| 关 键 词： | 钛基材 薄膜 纳米压痕 摩擦磨损 磁控溅射 |
Nanoindentation and Friction/Wear Behaviors of Magnetron Sputtered CNx/SiC Bilayer Films on Titanium(TA2)Substrate |
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| XU Xiao-jing,ZHUO Liu-cheng,XIA Deng-fu,WEI Bao-cun,HAO Xin-ni.Nanoindentation and Friction/Wear Behaviors of Magnetron Sputtered CNx/SiC Bilayer Films on Titanium(TA2)Substrate[J].Tribology,2009,29(3). |
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| Authors: | XU Xiao-jing ZHUO Liu-cheng XIA Deng-fu WEI Bao-cun HAO Xin-ni |
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| Institution: | Institute of Advanced Forming Technology;Jiangsu University;Zhenjiang 212013;China |
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| Abstract: | The nano-indentation and friction/wear properties of CNx film in CNx/SiC(carbon nitride/silicon carbon) double layer thin film(SiC film as interlayer) deposited on titanium(TA2) substrate using magnetron sputtering at room temperature were investigated.The results show that the CNx film exhibited a nano-hardness of 15.80 GPa,a Young's modulus of 130.88 GPa and a hardness-to-modulus ratio of 0.121.When sliding against a Si3N4(silicon nitride) ball(2 mm in radius) using ball-on-disc type wear tester at room t... |
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| Keywords: | titanium substrate thin films nanoindentation friction and wear magnetron sputtering |
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