常压双频驱动Ar/CCl4等离子体射流制备碳薄膜的研究

在大气压下双频Ar/CCl4 等离子体射流的驱动下，固定低频功率，通过改变射频功率在硅基底上制备了非晶态碳薄膜，并且通过程序进行相应的数值模拟计算。结果给出了不同功率下电子与离子的密度、温度、电场、电势、角度分布等参数对碳材料样品形貌的影响；样品变化趋势的预测及其原因的分析，以及与实验结果的对比。结果表明，对于双频大气压等离子体，射频可以独立控制等离子体的能量和反应强度，可以相对地控制产物。这为制备薄膜材料的形貌提供重要的实验基础。

Investigation of the carbon films by Ar/CCl4 plasma jet driven with dual-frequency power under atmospheric pressure

Amorphous carbon films were prepared on silicon substrate by changing RF power under the driving of dual-frequency Ar/CCl4 plasma jet at atmospheric pressure, and the corresponding numerical simulation was carried out by the program. The influence of the density, temperature, electric field, potential and angular distribution of electrons and ions on the morphology of carbon material samples at different powers was obtained. The prediction of the trend of the sample and the analysis of its causes, and the comparison with the experimental results were conducted. The results indicate that for the dual-frequency atmospheric pressure plasma, the radio frequency can control the energy and reaction intensity of the plasma independently, and can control the product relatively, which provides an important experimental basis for preparing the thin film morphology.