首页 | 本学科首页   官方微博 | 高级检索  
     检索      

װ�����ں濾������Թ�ŵ���ϴ�����о�
引用本文:王志文,韦卫星,赵元庆,何燕和,廖义奎.װ�����ں濾������Թ�ŵ���ϴ�����о�[J].核聚变与等离子体物理,2007,27(1):77-80.
作者姓名:王志文  韦卫星  赵元庆  何燕和  廖义奎
作者单位:(?????????????????????????????? 530006)
摘    要:建立了烘烤出气和辉光放电清洗(GDC)出气的物理模型,研究了装置器壁的烘烤出气和辉光放电清洗出气特点.烘烤出气是体出气,出气过程满足扩散方程;GDC出气是溅射脱附过程,它主要是器壁表面的溅射诱导出气.由此分析了HL-1M装置的烘烤出气和辉光放电清洗出气特点,得出了一些经验公式.

关 键 词:出气  扩散  辉光放电  装置  器壁  烘烤  辉光放电清洗  研究  chamber  vacuum  wall  conditioning  during  glow  discharge  baking  经验公式  分析  壁表面  脱附过程  扩散方程  物理模型
文章编号:0254-6086(2007)01-0077-04
修稿时间:2006-03-232006-10-13

Study on out-gassing by baking and glow discharge during wall conditioning of vacuum chamber
WANG Zhi-wen,WEI Wei-xing,ZHAO Yuan-qing,HE Yan-he,LIAO Yi-kui.Study on out-gassing by baking and glow discharge during wall conditioning of vacuum chamber[J].Nuclear Fusion and Plasma Physics,2007,27(1):77-80.
Authors:WANG Zhi-wen  WEI Wei-xing  ZHAO Yuan-qing  HE Yan-he  LIAO Yi-kui
Institution:(Guangxi University for Nationalities, Nanning 530006)
Abstract:The model of out-gassing by baking and glow discharge cleaning(GDC) is set up.The properties of them are studied.Out-gassing by baking is from bulk and it obeys the diffusion equation.Out-gassing of glow discharge cleaning is mainly on surface,it is inducement out-gassing by sputtering.Thus the properties of out-gassing for baking and GDC on the HL-1M tokamak are analyzed.Some empirical formulas are given.
Keywords:Out-gassing  Diffusion  Glow discharge cleaning
本文献已被 CNKI 维普 万方数据 等数据库收录!
点击此处可从《核聚变与等离子体物理》浏览原始摘要信息
点击此处可从《核聚变与等离子体物理》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号