| 未来制造业和加工业中的等离子体 |
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| 引用本文： | 邱孝明.未来制造业和加工业中的等离子体[J].核聚变与等离子体物理,1998,18(4):53-58. |
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| 作者姓名： | 邱孝明 |
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| 作者单位： | 核工业西南物理研究院 |
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| 摘 要： | 从两组元或三线元等离子体的一些基本性质出发，分析了等离子体在超大规模集成电路生产，扁平显示器技术，光导纤维生产和未来光计算机芯片制造，废物处理，新材料制备等中十分诱人的应用前景。
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| 关 键 词： | 尘埃等离子体 鞘层 刻蚀 等离子体化学 库仑晶化 |
PLASMA IN FUTURE MANUFACTURING AND PROCESSING INDUSTRIES |
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| QIU Xiaoming.PLASMA IN FUTURE MANUFACTURING AND PROCESSING INDUSTRIES[J].Nuclear Fusion and Plasma Physics,1998,18(4):53-58. |
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| Authors: | QIU Xiaoming |
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| Abstract: | Prospective applications of plasma in the production of ultra large scale integrated circuits,the technology of flat panel displays,the manufacturing of optical fibers and (future) optical computing chips,waste disposal,and the preparation of various new functional materials are surveyed on the basis of its fundamental properties. |
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| Keywords: | Dust plasma Sheath Etching Plasma chemistry Coulomb crystallization |
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