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Properties of boron-doped ZnO thin films deposited by pulsed DC magnetron sputtering at different substrate temperatures
Authors:B Wen  C Q Liu  N Wang  H L Wang  S M Liu  W W Jiang  W Y Ding  W D Fei  W P Chai
Institution:1. Engineering Research Center of Optoelectronic Materials and Devices, School of Materials Science and Engineering, Dalian Jiaotong University, Dalian, 116028, People’s Republic of China
2. School of Materials Science and Engineering, Harbin Institute of Technology, Harbin, 150001, People’s Republic of China
3. School of Mechanical Engineering, Qinghai University, Xining, 810016, People’s Republic of China
Abstract:
Keywords:
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