Ion beam mixing of Al/Fe binary systems |
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Authors: | B Rauschenbach M Posselt R Küchler |
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Institution: | (1) Central Institute for Nuclear Research Rossendorf, Academy of Science of the GDR, P.O.B. 19, DDR-8051 Dresden, German Democratic Republic |
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Abstract: | Ion beam mixing of Al layers on Fe and Fe layers on Al are studied by irradiation with 200 keV Xe+-ions at room temperature as a function of the thickness of the top layer and of the ion fluence from 5×1015 to 7.5×1016ions/cm2. Deconvolution procedures are needed to separate the influence of the ion sputter profiling by AES from the ion beam induced mixing effects. Auger electron spectroscopy data reveal that the mixing induced diffusivity ought to be considered as a function of concentration. The diffusion coefficients are evaluated by the Boltzmann-Matano method. A strong dependence of the diffusion coefficients and also the mixing efficiencies from the ion dose, the depth of the interface and the nuclear energy deposition were observed. Results are discussed in terms of the diffusional and collisional mixing as well as chemical affinity of both Fe and Al. |
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Keywords: | 61 80 68 35Fx |
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