Thin-film aggregate color centers as media for frequency domain optical storage |
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Authors: | C Ortiz R M Macfarlane R M Shelby W Lenth G C Bjorklund |
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Institution: | 1. IBM Research Laboratory, 5600 Cottle Road, 95193, San José, CA, USA
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Abstract: | Thin films of aggregate color centers have been produced by electron and ion irradiation of bulk alkali halide crystals. The transverse spatial distribution of the centers was controlled on a submicron scale using electron lithography. Photochemical hole burning has been accomplished for the first time in a thin film of color centers, using the 6070 Å zero-phononN 1 line produced by ion and electron irradiation of NaF crystals. |
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Keywords: | 78 20 78 30 78 55 |
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