Fabrication of planar gratings by direct ablation using an ultrashort pulse laser in a common optical path configuration |
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Authors: | K Venkatakrishnan NR Sivakumar B Tan |
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Institution: | (1) Precision Engineering and Nanotechnology Centre, School of Manufacturing and Production Engineering, Nanyang Technological University, 639798 Singapore, SG |
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Abstract: | Planar gratings have wide applications and to date, many methods for the fabrication of gratings have been reported. Ultrashort
pulse lasers have been used for the machining of gratings primarily because they allow direct ablation and the manufacturing
of sub-wavelength structures. In this paper, we present a novel direct ablation technique for the fabrication of planar gratings
which makes use of the interference of ultrashort pulses in a common optical path configuration. This technique of grating
fabrication not only simplifies the optical setup, but also immunizes the system to extraneous and inherent vibrations, thus
enabling the manufacturing of planar gratings of good edge acuity. We have successfully fabricated planar gratings on a copper
substrate.
Received: 6 November 2001 / Accepted: 4 March 2002 / Published online: 10 September 2002
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ID="*"Corresponding author. Fax: +65/77-904-674, E-mail: mvenkata@ntu.edu.sg |
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Keywords: | PACS: 42 15 Eq 42 25 Hz 42 62 Cf |
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