Differential evaluation of the Hall effect in silicon with oxygen-related donors

Three kinds of samples were used to form Co suicides by thermal annealing: firstly, a Co film of about 370 Å thick, evaporated on a (100) single crystal Si (Si ^c /Co); secondly, an evaporated boron-containing Si (Si ^e (B)) layer on the top of the first sample (Si ^c /Co/Si ^e (B)). The last sample is in the Co film of the first sample we deposited a Si^e(B) layer (Si ^c /Co/Si ^e (B)/Co). A laterally uniform CoSi₂ layer can be formed from the second and the third samples by annealing at 450 °C. In the first sample, the CoSi₂ can be formed only at temperatures above 500 °C and the disilicide is laterally less uniform than in the second and third samples. The Schottky barrier heights of the three samples derived from the forward and reverse I–V characteristics show that the barrier height is 0.01–0.02eV higher in the uniform case than in the nonuniform case.