Sputtered deposited nanocrystalline ZnO films: A correlation between electrical, optical and microstructural properties |
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| Authors: | J Lee W Gao Z Li M Hodgson J Metson H Gong U Pal |
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| Institution: | (1) Department of Mechanical Engineering, The University of Auckland, Private Bag, 92019 Auckland, New Zealand;(2) Department of Chemical and Materials Engineering, The University of Auckland, Private Bag, 92019 Auckland, New Zealand;(3) Department of Chemistry, The University of Auckland, Private Bag, 92019 Auckland, New Zealand;(4) Department of Materials Science, National University of Singapore, Singapore, Singapore;(5) Instituto de Física, Universidad Autónoma de Puebla, Apdo. Postal J-48, Puebla, Pue., 72570, Mexico |
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| Abstract: | Zinc oxide thin films were prepared by dc (direct current) and rf (radio frequency) magnetron sputtering on glass substrates. ZnO films produced by dc sputtering have a high resistance, while the films produced using rf sputtering are significantly more conductive. While the conductive films have a compact nodular surface morphology, the resistive films have a relatively porous surface with columnar structures in cross section. Compared to the dc sputtered films, rf sputtered films have a microstructure with smaller d spacing, lower internal stress, higher band gap energy and higher density. Dependence of conductivity on the deposition technique and the resulting d spacing , stress, density, band gap, film thickness and Al doping are discussed. Correlations between the electrical conductivity, microstructural parameters and optical properties of the films have been made. PACS 73.25.+i; 81.15.cd; 81.05.ys |
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