Periodic arrays of submicron Si and Ni dots on SiO2 fabricated using linearly polarized Nd:YAG pulsed laser

Periodic arrays of submicron Si and Ni dots were fabricated by only irradiating a linearly polarized Nd:YAG pulsed laser beam to Si and Ni thin films deposited on silicon dioxide (SiO₂) film. The interference between an incident beam and a scattered surface wave leads to the spatial periodicity of beam energy density distribution on the surface of the irradiated samples. A thin film was melted using a laser beam, and the molten film was split and condensed owing to its surface tensile according to the periodic energy density distribution. Then, the fine lines (line and space structure) were formed periodically. After the formation of fine lines, the sample was rotated by 90°, and the laser beam was irradiated. The periodic energy density distribution was generated on the fine lines, and the lines were split and condensed. Eventually, the periodically aligned submicron dots were fabricated on the SiO₂ film. PACS 79.20.Ds; 42.62.-b; 81.40.-z