Al and Ag diffusion study in α-titanium |
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| Authors: | LL Araújo M Behar |
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| Institution: | (1) National Laboratory of Solid State Microstructures and Materials Science and Engineering, Nanjing University, Nanjing, 210093, China;(2) National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing, 210093, China |
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| Abstract: | The diffusion of implanted Al and Ag in !-Ti has been studied in the 948-1073 and 823-1073 K temperature ranges by using the nuclear reaction analysis and Rutherford backscattering techniques, respectively. The measurements show that for both solutes, the diffusion coefficients follow a linear Arrhenius plot, the characteristic diffusion parameters D0 and Q being the following: for Al, D0=(1.4ǃ.2) ᎒-2 m2 s-1 and Q=326ᆞ kJ/mol and for Ag, D0=(1ǂ.75) ᎒-4 m2 s-1 and Q=279Lj kJ/mol. The above parameters are typical of a normal substitutional behavior. |
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