Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices |
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Authors: | Xu Fei Yuan Shi Yang Cao |
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Institution: | (1) Modern Education Technical Department, Dalian Polytechnic University, 1# Qinggongyuan Road, Dalian, 116034, P.R. China;(2) School of Vocational Technology, Liaoning Shihua University, Fushun, 113001, P.R. China;(3) College of Traffic, Jilin University, Changchun, 130012, P.R. China |
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Abstract: | Photosensitive poly(MMA-co-GMA) for optical waveguide was synthesized, and the refractive index of the polymer film was tuned
in the range of 1.481–1.588 at 1550 nm by mixing with bis-phenol-A epoxy resin. The film, which was made by spinning coated
the poly(MMA-co-GMA) with photo initiator, had good UV light lithograph sensitivity, high glass transition temperature (T
g
: 153°C, after crosslinking) and good thermal stabilities (T
d
: up to 324°C, after crosslinking). The optical waveguides with very smooth top surface were fabricated from the resulting
polymer by direct UV exposure and chemical development. For waveguides with cladding, the propagation losses of the channel
waveguides were measured to be below 3 dB/cm at 1550 nm. |
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Keywords: | |
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