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Effect of oxygen implantation on ionoluminescence of porous silicon
Authors:J uk  T J Ochalski  M Kulik  J Li kiewicz  A P Kobzev
Institution:

a Institute of Physics, Maria Curie-Skłodowska University, Pl. M. Curie-Skłodowskiej 1, 20-031 Lublin, Poland

b Joint Institute of Nuclear Research, Dubna, Russian Federation

Abstract:We report on ionoluminescence investigations of porous Si prepared from the p+-type Si, which exhibited, after prolonged ambient air exposure, moderate photon emission with a maximum in the red–orange region. In an attempt to activate a shorter wavelength emission, the samples were implanted with 225 keV O+ ions at the dose of 1×1017 cm−2. The strong blue band at 2.7 eV, well known in silica, has emerged in the ionoluminescence spectra following the oxygen implantation. The results of the comparative ionoluminescence experiments, performed on both porous Si and two forms of silica, show the important role of SiO2 defect-related states in ion-induced optical emission from porous Si.
Keywords:Porous silicon  Ionoluminescence  Ion implantation
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