Lattice site occupation and precipitate dissolution of implanted and irradiated Al(Rh) and Al(Ir) |
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| Authors: | I Khubeis R Gerber O Meyer |
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| Institution: | 1. Kernforschungszentrum Karlsruhe, Institut für Nukleare Festk?rperphysik , P.O. Box 3640, D-7500, Karlsruhe, Federal Republic of Germany;2. Dept. of Physics , Jordan University , Amman, Jordan;3. Kernforschungszentrum Karlsruhe, Institut für Nukleare Festk?rperphysik , P.O. Box 3640, D-7500, Karlsruhe, Federal Republic of Germany |
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| Abstract: | Abstract The apparent substitutional fraction, fs , of Rh and Ir implanted into Al single crystals at 293 K with peak concentrations of 0.17±0.01 at.% is 0.57 ± 0.02 and 0.47±0.02, respectively. Upon annealing to 593 K fs decreases and the critical angles of the impurities narrow due to partially coherent precipitate formation. Irradiation with 300 keV Ar ions at 77 K with deposited energy densities up to 20 dpa leads to precipitate dissolution accompanied by an increase of fs up to 0.70±0.02 for Al(Rh) and 0.82±0.02 for Al(Ir). The relatively high fs values do not decrease during annealing from 77 K to 293 K, indicating that vacancy trapping is not a dominant process. Precipitate formation seems therefore to limit the maximum obtainable fs values during implantation at 293 K for these systems. |
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| Keywords: | Lattice site occupation precipitate dissolution ion implantation Al(Rh) Al(Ir) |
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