Growth of electron energies with ion beam injection in a double
plasma device |
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Authors: | M K Mishra A Phukan M Chakraborty K S Goswami |
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Institution: | (1) Center of Plasma Physics, Tepesia, Kamrup, 782402 Assam, India |
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Abstract: | This paper reports about the observed energy growth of
both high and low energetic electron species in the target plasma region
with the increase in plasma potential in the source region of a double
plasma device. This situation can be correlated to the injection of an ion
beam from source to target plasma region. Plasma is solely produced in the
source region and a low-density diffuse plasma is generated in the target
region by local ionization between the neutral gas and the high energetic
electrons coming from the source region. The growth of electron energy is
accompanied by a decrease in diffuse plasma density. It is observed that
although energy of high energetic group increases with the injected beam
energy, the diffuse plasma density falls due to their decreasing population. |
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Keywords: | 52 25 Jm Ionization of plasmas 52 70 -m Plasma diagnostic techniques and instrumentation 52 80 -s Electric discharges |
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