Electrodeposition of mesoporous ruthenium oxide using an aqueous mixture of CTAB and SDS as a templating agent |
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| Authors: | Kyung-Hwa KimKwan Sung Kim Gil-Pyo KimSung-Hyeon Baeck |
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| Institution: | a Department of Chemical Engineering, Inha University, Incheon, South Korea
b Department of Chemical and Biological Engineering, Seoul National University, Seoul, South Korea |
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| Abstract: | Mesoporous RuO2 films were electrochemically fabricated on ITO-coated glass substrate from aqueous ruthenium chloride (RuCl3·nH2O) solution. To achieve highly stable mesoporous structure, an aqueous mixture of cetyltrimethylammonium bromide (CTAB) and sodium dodecyl sulfate (SDS) was used as a templating agent.The mesoporous structure was confirmed by small angle X-ray diffraction (SAXRD) and transmission electron microscopy (TEM). The addition of small amount (10wt%) of CTAB significantly improved the stability of porous structure. The crystallinity of synthesized RuO2 thin film was confirmed by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). Specific capacitance of the synthesized films was evaluated by measuring cyclic voltammetry (CV) and charge-discharge curves in 0.5 M H2SO4. Compared with non-porous electrode, mesoporous RuO2 showed higher supercapacitor performance. |
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| Keywords: | Ruthenium oxide Electrodeposition Mesoporous Supercapacitors |
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