A study of electrical enhancement of polycrystalline MgZnO/ZnO bi-layer thin film transistors dependence on the thickness of ZnO layer |
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| Institution: | 1. Department of Nano Semiconductor Engineering, Korea Maritime and Ocean University, Busan 606-791, Republic of Korea;2. Division of Electrical and Electronics Engineering, Korea Maritime and Ocean University, Busan 606-791, Republic of Korea;3. Department of Radio Communication Engineering, Korea and Ocean Maritime University, Busan 606-791, Republic of Korea;4. Division of Electron Microscopic Research, Korea Basic Science Institute, Daejeon 305-333, Republic of Korea;5. Korea Research Institute of Standards and Science, 267 Gajeong-Ro, Yuseong-Gu, Daejeon 305-340, Republic of Korea |
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| Abstract: | A polycrystalline MgZnO/ZnO bi-layer was deposited by using a RF co-magnetron sputtering method and the MgZnO/ZnO bi-layer TFTs were fabricated on the thermally oxidized silicon substrate. The performances with varying the thickness of ZnO layer were investigated. In this result, the MgZnO/ZnO bi-layer TFTs which the content of Mg is about 2.5 at % have shown the enhancement characteristics of high mobility (6.77–7.56 cm2 V−1 s−1) and low sub-threshold swing (0.57–0.69 V decade−1) compare of the ZnO single layer TFT (μFE = 5.38 cm2 V−1 s−1; S.S. = 0.86 V decade−1). Moreover, in the results of the positive bias stress, the ΔVon shift (4.8 V) of MgZnO/ZnO bi-layer is the 2 V lower than ZnO single layer TFT (ΔVon = 6.1 V). It reveals that the stability of the MgZnO/ZnO bi-layer TFT enhanced compared to that of the ZnO single layer TFT. |
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| Keywords: | MgZnO/ZnO ZnO Thin film transistors RF-sputter Hetero-structure |
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