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A Micromachined SiO2/Silicon Probe for Neural Signal Recordings
作者姓名:隋晓红  裴为华  张若昕  鲁琳  陈弘达
作者单位:State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083
基金项目:Supported by the National High Technology Research and Development Programme of China under Grant No 2005AA311030, and the National Natural Science Foundation of China under Grant No 60536030.
摘    要:The development of an implantable five channel microelectrode array is presented for neural signal recordings. The detailed fabrication process is outlined with four masks used. The SEM images show that the probe shank is 1.2mm long, 100μm wide and 30μm thick with the recording sites spaced 200μm apart for good signal isolation. The plot of the single recording site impedance versus frequency is shown by test in vitro and the impedance declines with the increasing frequency. Experiment in vivo using this probe is under way.

关 键 词:神经信号录制  微电极阵列  信号隔离    二氧化硅
收稿时间:2006-03-23
修稿时间:2006-03-23

A Micromachined SiO2/Silicon Probe for Neural Signal Recordings
SUI Xiao-Hong, PEI Wei-Hua, ZHANG Ruo-Xin, LU Lin, CHEN Hong-Da.A Micromachined SiO2/Silicon Probe for Neural Signal Recordings[J].Chinese Physics Letters,2006,23(7):1932-1934.
Authors:SUI Xiao-Hong  PEI Wei-Hua  ZHANG Ruo-Xin  LU Lin  CHEN Hong-Da
Abstract:
Keywords:
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