| Atom Lithography with a Chromium Atomic Beam |
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| 作者姓名： | 张文涛 李同保 |
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| 作者单位： | [1]Department of Physics, Tongji University, Shanghai 200092 [2]Department of Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004 |
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| 基金项目： | Supported by the Shanghai Foundation for Development of Science and Technology under Grant No 0259nm034. |
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| 摘 要： | Direct write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms deposit on the substrate. We design an experiment setup to fabricate chromium nanolines by depositing an atomic beam of ^52Cr through an off-resonant laser standing wave with the wavelength of 425.55 nm onto a silicon substrate. The resulting nanolines exhibit a period of 215±3 nm with height of I nm.
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| 关 键 词： | 原子平版印刷术 铬原子束 纳米结构 波长 |
| 收稿时间： | 2006-06-10 |
| 修稿时间： | 2006-06-10 |
Atom Lithography with a Chromium Atomic Beam |
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| ZHANG Wen-Tao,LI Tong-Bao.Atom Lithography with a Chromium Atomic Beam[J].Chinese Physics Letters,2006,23(11):2952-2955. |
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| Authors: | ZHANG Wen-Tao LI Tong-Bao |
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