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Site Preference of Se and Te in Bi_2Se_(3-x)Te_x Thin Films
Abstract:The ternary topological insulators Bi_2Se_(3-x)Te_x have attracted a great deal of attention due to their exotic physical and chemical properties.While most of the studies focus on the properties of these ternary TIs,limited research was performed to investigate the dynamic atomic stack of its crystal structure.We prepared highquality Bi_2Se_(3-x)Te_x thin films on Ga As(111)B substrates using molecular beam epitaxy,characterized with Raman spectroscopy,x-ray diffraction and photoelectron spectroscopy.It is found that when Se is replaced by Te,the preferred substituting sites are the middle layer at 0x1,and this is also valid for Se substituting Te at 2x3.In the middle region,the substituting atoms prefer to go to the first and the fifth layer.
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