Vacancy in 6H—Silicon Carbide Studied by Slow Positron Beam

The defect changes in 6H-SiC after annealing and 10MeV electron irradiation have been studied by using a variable-energy positron beam.It was found that after annealing,the defect concentration in n-type 6H-SiC decreased due to recombination with interstitials.When the sample was annealed at 1400℃ for 30 min in vacuum,a 20-nm thickness Si layer was found on the top of the SiC substrate,this is a direct proof of the Si atoms diffusing to surface when annealed at high temperature stages.After 10MeV electron irradiation,for n-type 6H-SiC,the S parameter increased from 0.4739 to 0.4822,and the relative positron-trapping rate was about 27.878 times of the origin sample,this shows that there are some defects created in n-type 6H-SiC.For p-type 6H-SiC,it is very unclear,this may be because of the opposite charge of vacancy defects.