Thermal Annealing of SiO2 Fabricated by Flame Hydrolysis Deposition |
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作者姓名: | 张乐天 谢文法 吴远大 邢华 李爱武 郑伟 张玉书 |
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作者单位: | NationalIntegratedOptoelectronicsLaboratory,JilinUniversity,Changchun130023 |
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摘 要: | Amorphous Si02 films were fabricated on Si substrates by flame hydrolysis deposition as buffer layers applied in the planar optical waveguides. Then the Si wafers with the porous particles were put into electric furnace annealing at different temperatures for consolidation in air. The products were characterized by x-ray diffraction,x-ray photoelectron spectroscopy, atomic force microscopy, and variable angle spectroscopic ellipsometry. It was found that different structures at different annealing temperatures were obtained. When the annealing temperature arrives at 1400℃, SiO2 is continuous and dense and the refractive index at 1550nm is 1.4564, whichis highly desirable.
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关 键 词: | SiO2 二氧化硅薄膜 热处理 退火 火焰水解沉积 制作 光波导 |
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